An inductively coupled plasma (ICP) is a type of plasma source in which the energy is supplied by electrical currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields.
There are two types of ICP geometries: planar and cylindrical. In planar geometry, the electrode is a coil of flat metal wound like a spiral. In cylindrical geometry, it is like a helical spring.
When a time-varying electric current is passed through the coil, it creates a time varying magnetic field around it, which in turn induces azimuthal electric currents in the rarefied gas, leading to break down and formation of a plasma.
ICP discharges are of relatively high electron density, on the order of 1015 cm-3.As a result, ICP discharges have wide applications where a high density plasma is necessary.
Another benefit of ICP discharges is that they are relatively free of contamination because the electrodes are completely outside the reaction chamber. In a capacitively coupled plasma (CCP), in contrast, the electrodes are placed inside the reactor and are thus exposed to the plasma and subsequent reactive chemical species.

Allwin21 Corp can provide the following refurbished  ICP (inductively coupled plasma) equipment.

• STS 320 ICP
• Plasma Therm 700 ICP
• Plasma Therm 790 ICP

Allwin21 Corp. can also provide  Allwin21 Corp proprietary AW Control Software and Superior Temperature Control Technology  to upgrade the refurbished equipment which provides the following significant advantages

• Integrated process control system
• Real time graphics display
• Real time process data acquisition, display, and analysis
• Programmed comprehensive calibration and diagnostic functions
• Better performance and maintenance than the original systems