Manufacturer: Hitachi
Model: S5200
Type: inspection sem
Condition: Used,excellent
Vintage: Dec 2004
Sale condition: Refurbished,installation with 30 days warr
Sales price: $280,000 USD
Comments: "true Inlens" SEM
*FE- Cathode
*Resolution: 0.5nm @ 30kV/ 1.8nm @ 1kV
*load lock
*Probe size 1cm x 0.5cm
*deinstalled

A Cold Field Emission Gun Scanning Electron Microscope (FEGSEM) of "below-the-lens" design capable of (manufacturer's claims) 1.5 nm resolution at 15 kV, 12 mm W.D.; and 2.5 nm resolution at 1 k, 2.5 mm W.D.  Magnification ranges from 30X to 500,000X.

 Refurbished Tencor/KLA-Tencor M-Gage 300 without printer.

The QUANTAX 200 is a modular Energy Dispersive Microanalysis System (EDS) designed to meet the demands of the most sophisticated analyst while maintaining the ease of operation required for today’s casual user. The QUANTAX’s hybrid pulse processor is capable of working at the industry’s highest count rates while maintaining the best possible resolution throughout the entire count range. The QUANTAX 200 features our fifth generation XFlash® detector – a Silicon Drift Detector (SDD) which needs no LN2 cooling, provides extremely high throughput rates and improved light element detection capabilities. Running under ESPRIT software, the analyst has access to the most sophisticated and flexible software routines for Qualitative and Quantitative analysis, as well as the advantage of advanced analysis techniques such as PTS/Spectral Imaging (HyperMap) and Line Profile Analysis. In addition the software has a flexible integrated data management system and automatic report generation.

- Model: S-4500 SEM
- Field Emission Scanning Electron Microscope (FE-SEM)

- Manufacturer: Hitachi
- Model: S8840
- Wafer Size: 200mm
- Hitachi S8840 CD SEM Mainframe

Model: S-8820 or S-8620

·         Vintage: 1996

·         Wafer Size: 150 mm

·         Throughput: 20 wafers per hour 5 pt meas. per wafer continuous

The LEO 982 Field emission scanning electron microscope (FE-SEM, Carl Zeiss SMT Inc. One Corporation Way Peabody, MA 01960) provides a means to achieve ultra high resolution images in the secondary emissive mode.

6 inch full wafer system for in-process inspection and metrology of photoresist, e-beam resist, and nanolithographic structures: Semi-clean contamination level, No Au or Nobel metals allowed. Field emission gun with resolution to ~35 angstoms typical. On-board CD measurement and metrology functions. EDX Noran Instruments X-Ray Microanalysis system is controlled by a high-performance workstation with easy-to-use window manager

KLA-Tencor 5200 Overlay Registration System

- Model: KLA 5200 Overlay Registration System
- 200mm wafer capable system
- Fully automated non contact box-in-box measurement (stepper alignment)
- Uses Coherence Probe Microscopy (CPM) technology
-lowers stepper cost of ownership
- Measures all layers, including low-contrast or grainy targets
- Operations Manual for KLA 5200 Overlay Registration System

KLA 2135 Defect Inspection System, 200mm, Year 1997. With Model-2552 Data Analysis Remote Review Station.

#2135 S/NW21XX1060;

#2552 S/N-W255X845

The Micrion 9500 is a highly sophisticated Focused Ion Beam System and is capable of performing very delicate microsurgery and cross-sectioning.  

Metrology & Inspection  Hitachi SEM S-2500ci

KLA Tencor Ultrapointe Laser Imaging System 1010A

Tencor Thin Film Monitor TF-1,Price:$4,500.00,AS IS,WHERE IS,Advanced Payment.

Metrology & Inspection   Hitachi SEM S-2300

Metrology & Inspection Hitachi SEM S-2150

 Metrology & Inspection Hitachi SEM S800

 Metrology & Inspection Hitachi SEM S-570

 Metrology & Inspection JEOL JSM-840

KLA-Tencor/Prometrix SM-200 SpectraMap 200 8" Wafer Film Thickness Measurement System

The system does not come with the computer.