AE 2001 is a single wafer downstream isotropic etch system, designed to etch thin films such as poly silicon, silicon nitride and CVD oxides.Utilizing the proven Aura downstream microwave source and a dedicated reactor chamber,

Matrix is a Registered Trademark of Matrix Integrated Systems, Inc.The model 303 is an electro-mechanical production system used to etch materials such as nitride, oxide poly-silicon etc. from the surface of silicon or other substrate. Each wafer is processed individually by means a chemical reaction induced by a gas plasma.

Tegal 900 series Plasma/RIE etch System are used by the Semiconductor Industry for integrated circuit fabrication. The system are used in one part of the sequence of manufacturing steps that transfer a pattern formed from a layer of photosensitive material, the photoresist, to a layer that makes up a permanent part of the final device.

Lam 4420B, 8 inch wafer

Manufacturer: LAM
Model: 4428
Rainbow Main Frame
Rainbow System Software Version E1

Manufacturer: LAM Research
Model: Rainbow 4520

Manufacturer: LAM Research
Model: Lam 490
Serial: 1903

Tel Plasma Etcher 750C,good condition.

Tegal 1513e Plasma Etcher,used,good condition,complete with many spare parts

TEGAL  Inline Automatic Plasma Etcher. The Plasma Inline 803 is a fully automatic, microprocessor-based plasma chemistry etcher designed especially for the etching of silicon dioxide (Si02) thin film deposited on single crystal or polysilicon semiconductor wafers. It provides up to four process gases, two process channels and a clean channel.

TOK TSE-306W PLASMA ETCHER ,System was in working condition before it was moved in to warehouse

Tegal Table and Gas Cabinet