DESCRIPTION (Video) New Matrix 105R VS Upgraded Matrix 105 VS Original Matrix 105
· Self contained microprocessor controlled single wafer in line Photoresist stripper/Asher. Photoresist removal system that reduces carbon chain polymer resist in non-damaging environment. Incorporates closed control loop of vital process parameter and eliminates device damage due to thermal and electrical causes.
· Maintains independent closed loop control of process parameter (pressure, RF power, temperature, gas flow and substrate position) thus, tighter process parameter controls and resulting to more optimized process.
· Pick and place cassette to cassette wafer transport system allows individual or batch/lot wafer selections
· Modular configuration allows for significant reduction in maintenance/repair time which increases system availability/utilization time
· Compact: footprint 27” (68.6 cm) X 39” (99.2cm) which takes up little Fab space
· Low temperature processing which eliminate thermal damage
· Phase and magnitude detectors which provide “real time” RF impedance for efficient match control and better power to load transfer
· Time or absolute end point detection system which reduces risk of over etching/under etching.
· Touch screen display for easy machine operation
· Independently controlled single arm robot for reliable wafer handling transport instead of the original frog wafer transfer
Allwin21 Corp. focuses on and professionally provides the following fully refurbished and customized Matrix Plasma Asher/Stripper/Descum/Etcher equipment with high Quality,right Cost,quick Delivery and excelent Service for Semiconductor industry,MEMS, Biomedical, Nanotechnology,Solar,LEDs etc.
Matrix 105R | Matrix 105/205/106 | Matrix 303