Matrix is a Registered Trademark of Matrix Integrated Systems, Inc.Matrix 105 provides high throughput in a single wafer system capable of  handling wide variety of substrates, including round, square and ranging from 3” up to 6”. By maintaining independent closed-loop system controls, the system optimizes vital device parameters. 

Gasonics  is a Registered Trademark of Novellus Corp.GaSonic Aura 1000 Plasma System is the microprocessor controlled down-stream, or  “ afterglow” photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute. The unit is fully automated, cassette-to-cassette, and is a single-wafer process design.  

The Branson IPC 3000 is a barrel plasma etcher that uses oxygen to etch organic films and residues such as photoresist in a process commonly referred to as "de-scumming." During a normal run for the Branson Barrel Etcher, the chamber is evacuated to under 0.5 torr pressure.

Gasonics  is a Registered Trademark of Novellus Corp. Gasonics Aura 2000LL is a 8" Cassette to Cassette ,Single Wafer Downstream Microwave Asher w/ Loadlock with microwave source and a dictated reactor chamber ,8" Cassette to Cassette ,Single Wafer Asher ,Configured for 4" - 8" wafers,Loadlock with cool-down station for processed wafer Gas box,

Aura 3010.The Aura 3010(Aura3000) is a single-wafer downstream photoresist asher, delivers high ash rates with low damage, a large process window, and a choice of process temperatures during the ashing process. The system has a user friendly menu-driven user interface, and is suitable for automation via SMIF (Standard Mechanical Interface) or AGV (Automated Guided Vehicle).3”, 4”, 5”, 6” and 8”wafer capability . 

Branson/IPC  L3200 single wafer downstream stripper,Dual quartz chambers for 100-150mm wafers( or 150-200mm wafers), cassette to casette operation

Matrix is a Registered Trademark of Matrix Integrated Systems, Inc.Matrix 10 provides high throughput in a single wafer system capable of handling wide variety of substrates, including round, square and ranging from 4” up to 8”. 

Gasonics  is a Registered Trademark of Novellus Corp.The Gasonics L3510 is a versatile downstream photoresist removal system,designed for clean, damage-free removal of the most difficult resist structures.Utilizing the production-proven L-Series platform, the L3510 has a wide process window due to its patented microwave plasma source.Programmable heating and process controls contribute to the systems’ unparalleled process flexibility.3”, 4”, 5”, 6” and 8”wafer capability.

TOK OPMA 1250 Plasma Asher
TOKYO OKA / TOK OPMA 1250 Plasma Asher.

The LFE PDS/PDE 301 is a barrel plasma etcher that uses oxygen to etch organic films and residues such as photoresist in a process commonly referred to as "de-scumming.

Genesis Microstar 200C Single Wafer Processing System, 8"

- Single Wafer Processing System
- Up to 8 inch wafer
- Robot wafer transfer
- Include manual

Used DRYTEK  MEGASTRIP 6  H.F. Photoresist Stripper. Features a large capacity, aluminum chamber that processes up to 25 - 8 in. wafers, 50 - 6 in. wafers, 75 - 5 in. wafers, 100 - 3 in. or 4 in. wafers.