AccuThermo AW 810M is a desktop rapid thermal processor for 5 to 8 inch wafer , which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems. 

AccuThermo AW 610 is a desktop rapid thermal processor for 2 to 6 inch wafer, which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems. 

AccuThermo AW 410 is a desktop rapid thermal processor for 2 to 4 inch wafer ,which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems

AG Heatpulse 610 is a rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity,  provide significant advantages over conventional furnace processing and conventional RTP systems.

AG Heatpulse 410 is a rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity,  provide significant advantages over conventional furnace processing and conventional RTP systems.

AG Heatpulse 210 is a rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity,  provide significant advantages over conventional furnace processing and conventional RTP systems.

The tool for Rapid Thermal Process is Peak ALP 5000 (Peak 8500).The Peak Rapid Thermal Processor or RTP System heats substrates with its SP35X lamp,which sits at top the chamber.Gases can be introduced  into the process chamber ,and with the vacuum option,the pressure within the process chamber can be lowered and raised.Wafers are moved into and out of the process chamber by the system.

The results of experiments performed to evaluate the use of a commercially available rapid thermal annealer (RTA) with a graphite susceptor for capless rapid thermal annealing to activate implants in GaAs are reported in many articles. The interior of the susceptor was easily charged with As by annealing a sacrificial GaAs wafer.

1 OVEN-Control
2 ZERO-crossing
3 Timer-Counter
4 RMS Analog Card
5 STD Interface Card
6 MIO-24-I/O
7 A/D-D/A