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4  Articles on Rapid Thermal Process
4  Rapid Thermal processors from Allwin21
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4  Light-Emitting Diode
4  2007-5-30 : Robot Control PCB for Matrix
4  2008-1-13 : New software controller for GaAs, InP and the other compound semiconductor processes
4  2007-4-30 : Technologies Solving the wafer transfer problem of the original index system for Gasonics Aura 1000 for plasma asher
4  Extended Range Pyrometer
4  Vacuum RTP VS Atmospheric Pressure RTP
4  Rapid Thermal Processing in LEDs
4  Rapid Thermal Processing in Solar Cell
4  Solar Power International 2008
4  Products on sale from Allwin21
4  Semicon West 2009
4  AG Heatpulse 610 exclusive licenced manufacturer
4  Move Notice
4  Semicon West 2010 and Intersolar 2010
 

AG Heatpulse 610 exclusive licenced manufacturer

 Allwin21 Corp. Merits of AccuThermo RTA RTP

 Allwin21 is the exclusive licenced manufacturer  for AG Heatpulse 610 from Mentron,an Applied Materials company.  Allwin21 is manufacturing the AccuThermo AW-410,AccuThermo AW-610,AccuThermo AW 810,originally the AG Heatpulse 610.The AccuThermo AW-410,AccuThermo AW-610,AccuThermo AW 810 have innovative software and more advanced temperature control technologies. 

              

   AccuThermo AW-410             AccuThermo AW-610                                      AccuThermo AW 810

 

Rapid Thermal Process

Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so they do not break due to thermal shock..Such rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.

Rapid thermal anneal (RTA) is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process (RTP).

AG Associates Heatpulse is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R&D centers, Institutes all over the world have been using AG Heatpulse Systems. 

Allwin21 Corp can provide the following refurbished RTP equipment

  

           

       Heatpulse 210                                  Heatpulse 610             

Allwin21 Corp. can also provide  Allwin21 Corp proprietary AW Control Software and Superior Temperature Control Technology  to upgrade the refurbished equipment which provides the following significant advantages

  • Integrated process control system
  • Real time graphics display
  • Real time process data acquisition, display, and analysis
  • Programmed comprehensive calibration and diagnostic functions
  • Better performance and maintenance than the original systems

 

RTP Typical Application Area v 

  • v Chip Maufacture
  •  Compound IndustryGaAs, GaN, GaP, GaInP,InP and SiC
  • v OptronicsPlanar optical waveguides,LASERs,LEDs and VCSELs
  • v Biomedical
  • v MEMS
  • v Nanotechnology

For a bibliography and reprints of technical journal articles regarding these RTP  applications, contact the Allwin21 Corp. Marketing Communications Department.

  

Rapid Thermal Processing in Solar Cell 

 

 

 

 

 

 

 

 

Vacuum Rapid Thermal processing ag 210 ag2101                          
JIPELEC ag 610 ag2146 used-line Jipelec JetClip sg AG Heatpulse4108 ag 4108 AG Heatpulse JetStar AG Heatpulse8108 ag4100 bid service JetClip AG Heatpulse8800 AST SHS2000 AST STEAG 2800
www.ssintegration.com ag 8108 ag4108 Techlink JetClip sg Rapid Thermal Oxide ssintegration ag 4100 Jipelec JetFirst AG Heatpulse410 ag410 specequipment RLA-3108 AG 310 Mattson annealsys rapid thermal processes
Jipelec JetStar heatpulse ag 2146 ssi Koyo Thermo Systems AG Heatpulse210 AST STEAG-MATTSON 2800 heat pulse Solaris Eclipse Rapid Thermal Annealing ag8800 modularpro RLA-1000 AG Heatpulse 4108 rapid thermal processor Steag AST SHS2000
Solaris 75 AG Heatpulse 8108 ag210 bidservice Solaris75 AG Heatpulse4100S STEAG Electronic Systems AG ag associates www.eng-sol.net AG Heatpulse 4100 ag 2106 Annealsys RLA-3000 Rapid thermal Anneal Engineering Solutions AG Heatpulse4100
www.annealsys.com AG Heatpulse 410 rapid thermal process eng-sol Solaris 150 AG Heatpulse 210 STEAG AG Heatpulse 310 JetFirst Rapid Thermal Annealer ag8108 AS-Master STEAG Electronic Systems Rapid Thermal Oxidation RTA RTP
www.modularpro.com RTO ag 8800 Modular Process Technology Jipelec JetClip AG Heatpulse 4100S STEAG 2800 ag 2101 Solaris150 AG Heatpulse310 ag610 AS-One Solaris AG310 ag2106 AS-Micro

 
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