AllWin21 Corp.

Manufacturer:Lam Research
Condition:Used (Refurbished and warranty is available). Contact Us for more information.

Wafer Size Capacity:4 to 6 inch capacity

System Description:

The Lam AutoEtch 490 is a fully automated, single-wafer plasma Silicon Dioxide etching system that processes 4-, 5-, 6-inch wafers and features top
powered electrode plate, programmable electrode spacing, and automatic wafer alignment and placement. Designed for continuous operation, the Lam AutoEtch 490 etcher is computer-controlled, allowing either manual or automatic control.

Wafer Transport

The wafer transport system is responsible for moving wafers through the system. It picks up a wafer from a cassette on the send indexer, centers and aligns it, transports it to the chamber for processing, and finally, when processing is complete, deposits it into a cassette on the receive indexer. Major assemblies in the wafer transport system include send and receive indexers, a load station that centers and aligns the wafer,
and entrance and exit loadlocks with mechanical arms.

Operator Controls

The operator controls consist of control panels with switches andindicator lights, and a computer-controlled operator interface that runs software.The etcher uses software to control machine functions, record and run process recipes, and warn of conditions that require the attention of an operator or maintenance technician. The software has a graphical user interface (GUI) that employs a combination of icons, buttons, and selectable commands, together with detailed graphics.

The system includes the following.

Send Indexer
Receive Indexer
Entrance Lifter
Exit Lifter
4 Pin Lifter
Gap Assembly
Lower Match Assembly
Upper Electrode Assembly
Lower Electrode Assembly
5 MFC Gas Box
Main Power Supply
Main Chamber Generator
2 Recipe Modules, 2 Master Modules
Front & Rear EMO Switches
Panels & Plexi Glass Covers (Standalone System)
Main Chamber, Hex Plate, Orifice Ring, Pump Ring
2 Channel Endpoint Detector