Corp. was formed in 2000 to provide
Asher Stripper Descum,
and Evaporator System,Metrology
and Tester high-tech
equipment, services and technical support in Semiconductor
industry,MEMS, Biomedical, Nanotechnology,Solar,LEDs etc..
Located in Santa Clara, the heart of Silicon Valley,
Allwin21 has been providing unique technical support, high
quality equipment and fast supplied spare parts worldwide.
We have maintained a global presence that has grown and expanded.
into the major high-tech manufacturing areas of the
world. We pride ourselves on developing lasting customer and
client relationships.Allwin21 is proud to announce it
is certified as ISO 9001:2008 compliant organizations.
is the exclusive
licensed manufacturer of
Heatpulse 610 Rapid
Thermal Processor. Allwin21 is manufacturing the
AW 830 AtmosPress
Rapid Thermal Processors and AccuThermo
AW 860V vacuum
Rapid Thermo Processors.Compared with traditional
RTP system, Allwin21"s AccuThermo AW RTPs have innovative
software and more advanced temperature control technologies.
temperature control with pyrometer or thermocouple temperature
- Precise time-temperature
profiles tailored to suit specific process requirements.
- Fast heating
and cooling rates unobtainable in conventional technologies.
wafer-to-wafer process cycle repeatability.
of external contamination.
- Small footprint
and energy efficiency.
- The watchdog
timer shuts down the lamps to prevent run-away heating of
is remanufacturing The
® AW 4450-Series Production Sputtering Systems, originally
Perkin Elmer 4450 sputter systems,with innovative
software with advanced controll technologies and new
design for much better performance and maintenance.The AccuSputter
® AW 4450-Series Production Sputtering Systems are manufactured
in the configuration of a manually-loaded system capable of
fully automatic operation. The
AccuSputter ® AW 4450 sputtering head is equipped with
three DeltaTM cathode or four round 8-inch positions ( Mo
flame sprayed shields and shutters standard).
® AW 4450-Series Production Sputtering Systems deposit
a wide variety of materials onto substrates such as ceramic,
metal, plastics, glass and semiconductors. The system can
also be used for RF sputter-etching, a process in which material
is removed from, rather than being deposited on, the substrates
prior to sputter deposition.These sputtering systems sequentially
deposit thin films of up to three or four different materials
onto a single substrate, thus attaining sandwich-structured
films such as multi-layer optical interference filters or
semiconductor devices. Resulting thin films range in thickness
from a few Angstroms up to several microns.
AccuSputter® AW 4450 Brochure
Description of Features:
- Advanced AccuSputter ®AW4450
Controller with GUI mounted in the main frame;
- Manual, Semi and Automatic
one button operation;
- Customer programming of
recipe for process parameters.
- GEM/SEC II functions (Optional)
- 24V DC control components
- DC Gear Motors for table
rotate and carriage moving;
- Advanced vacuum gauges
and control system;
- MFC gas control system;
- Advanced RF automatically
- DC and RF power are mounted
in the main frame;
- Fast Cycle Load Lock Operation
- High rate DeltaTM DC magnetron
- High throughput operation:
Automated load lock and controller sequences provide for
efficient pump down and pallet transfer to process chamber
- High uniformity: ±7% deposition
uniformity guaranteed with water-cooled rotating annular
substrate table; ±5% achievable.
- Ultra-clean vacuum: Cryopumped
and Meissner-trapped process chamber ensures contamination-free
conditions especially important for critical processes such
as the deposition of aluminum and platinum;
- Easy maintenance: Removable
deposition shields permit easy system cleaning. Automatic
cryopump regeneration minimizes downtime and inconvenience;
- Specialized pallets for
ease of substrate leading/unloading;
- "Drop in" target
for quick target changes, no screw to both with;
- "Snap-out" deposition
shields for quick, easy maintenance;
- Fail-safe system protection