
AccuThermo AW 410 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems.
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New AccuThermo AW 610
AccuThermo AW 610 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems.
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AccuThermo AW 810M is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems.
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GaSonic Aura 1000 Plasma System is the microprocessor controlled down-stream, or “ afterglow” photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute. The unit is fully automated, cassette-to-cassette, and is a single-wafer process design
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Matrix 105 provides high throughput in a single wafer system capable of handling wide variety of substrates, including round, square and ranging from 3” up to 6”. By maintaining independent closed-loop system controls, the system optimizes vital device parameters.
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Refurbished Branson IPC L3200
* Dual quartz chambers for 100-150mm wafers, cassette to casette operation
* Automatic pneumatic soft-lift assemblies for each chamber
* In-line gas filters (0.05 micron)
* Two PM 732 automatch networks
* Quartz halogen lamp for preheating
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